Intel and ASML achieve 'First Light' milestone with new High-NA lithography tech

ASML and Intel announce a significant milestone in ASML's leading High-NA lithography system, enabling its first light source, the 'First Light' milestone.

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Anthony Garreffa

TweakTown

Published Feb 28, 2024 8:37 PM CST
Updated Mar 12, 2024 6:03 PM CDT

45-second read time

ASML and Intel have reached the "First Light" milestone using ASML's latest High-NA lithography system, turning on its light source and making the light reach resist on the wafer.

ASML's new Twinscan EXE:5000 High-NA EUV system delivered to Intel (source: Intel)

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The report is coming from Reuters, with this being a critical first step in the very latest manufacturing technology from ASM; the "first light" milestone means that one of the critical components of ASML's new Twinscan EXE-5000 system is operational, but not at its peak performance.

Marc Assinck, a spokesman for ASML, explained: "Technically, this 'first light' actually is 'first light on the wafer.' The light source was already working, now we have the photons 'in resist' on the wafer".

Read more: ASML ships industry's first High-NA EUV lithography scanner to Intel

ASML's exciting new Twinscan EXE High-NA EUV lithography machines feature projection optics with a 0.55 numerical aperture that can achieve a resolution of down to 8nm with a single exposure. Compared to a regular Low-NA EUV system that can do 13.5nm resolution with a single exposure.

The new Twinscan EXE:5000 High-NA EUV lithography machine is located at ASML's laboratory in Veldhoven, Netherlands, while a second machine is currently being assembled at an Intel facility near Hillsboro, Oregon.